![]() |
![]() |
![]() |
![]() |
Porous silicon wafers | Porous silicon membranes | Bragg mirrors | Lift-off ready PSi layer |
Porous silicon wafers
- micro, meso and macro PSi layer substrates
- PSi multilayered structures
- PSi covered surface: 100% or edge excluded
- Localized PSi wells
Production of homogeneous porous silicon (PSi) wafers: |
|
Porous silicon Membranes
- PSi membranes on polymeric films
- Freestanding PSi membranes
- Square or rectangular-shaped membranes from 1 to 10cm² and higher.
- Ranging parameters:
- Thickness >= 30µm.
- Porosity : [45 – 70] %.
- Pore size : [10 to 60] nm.
All membranes are flexible and fully porous.
High surface area PSi membranes from 1cm² to 300cm² (8'' wafer). |
|
Large variety of flexible membranes suitable for gas or liquid filtration applications, electronic devices substrates,….
|
|
Bragg mirror like reflectors
By controlling the porosity and the thickness of multilayered PSi structures, we can change the PSi surface reflection coefficient in VIS and IR light and produces reflector like Bragg mirrors.
|
Lift-off ready PSi layers on silicon
- 100% surface area PSi wafers
- Pre-cut silicon substrates
We can produce lift-able dense PSi layers on silicon.Compatible with microelectronics device processing.
|
|