Porous silicon wafers	Porous silicon membranes	Bragg mirrors	Lift-off ready PSi layer

Porous silicon wafers

Production of homogeneous porous silicon (PSi) wafers: micro, meso and macro PSi layer substrates PSi multilayered structures PSi covered surface: 100% or edge excluded Localized PSi wells We adjust our processing conditions according to your needs in thickness, porosity and morphology. Please contact us and describe your need

Mesoporous silicon Macroporous Microporous-filled macropores

Porous silicon Membranes

All membranes are flexible and fully porous.


• PSi membranes on polymeric films



High surface area PSi membranes from 1cm² to 300cm² (8'' wafer). Porosity : [45 – 70] %. Pore size : [10 to 60] nm.

156x156 mm² membrane of 2µm thick 8 inches diameter PSi membrane of 50µm



• Freestanding PSi membranes

Large variety of flexible membranes suitable for gas or liquid filtration applications, electronic devices substrates,….

Square or rectangular-shaped membranes from 1 to 10cm² and higher. Ranging parameters: Thicknesses: 30 and 50µm. Porosity : [45 – 50] %. Pore size : [10 to 15] nm.

Freestanding PSi membranes 4x4cm² of 50µm Freestanding PSi membranes 1x1cm² of 50µm

Please contact us for any further information and possibilities about these membranes

Bragg mirror like reflectors

By controlling the porosity and the thickness of multilayered PSi structures, we can change the PSi surface reflection coefficient in VIS and IR light and produces reflector like Bragg mirrors.


Multilayered PSi structures Blue light 6’’ wafer reflector 4x4 cm² reflectors PSi membrane Bragg mirrors on polymeric films Bragg mirrors freestanding

Please contact us for any particular reflectance need

Lift-off ready PSi layers on silicon

We can produce lift-able dense PSi layers on silicon.Compatible with microelectronics device processing. 100% surface area PSi wafers Pre-cut silicon substrates

Lift-able PSi structures Lift-off

Please contact us for any sizes, porosities and thicknesses